3n 80/20 Cr Wt% Nicr Flat Targets

• Aplicação: Industrial
• fórmula: nicr
• classificação: Metal Traget
• padrão de qualidade: grau industrial
• certificação: iso
• forma: Rotary,Flat,Round
• N ° de Modelo.: CYT-NiCr
• Pacote de Transporte: Wooden Box
• Especificação: Customized Size
• Marca Registrada: CANYUAN
• Origem: China
• Capacidade de Produção: 1000PCS

Descrição de Produto

 

Nickel-chromium rotating targets are made by vacuum melting process as well as hot or cold spraying process.
Nickel-chromium flat targets are produced by vacuum melting, rolling, machining and other processes
 

Nickel-chromium Targets Specification
Application	PVD sputtering materials
Material	Nickel-chromium
Purity	3N,80/20Crwt%,60/40 Cr wt%,etc
Size	customized
Thickness	customized
Shape	Rotary sputtering Target, Ring type, sheet type, Plat type and Tube type
Density	8.4g/cm3
Melting Point	3547ºC
Produce method	HIP,sintering,spray

Our Advantage

Operation Process

Packing Picture

Application:

Relating Product

Material	Purity (N)	Components (wt%)	Density	Melting  Point	Thermal Conductivity (Wm-1K-1)	Coefficient of  expansion (10-6k-1)	Production  Process
Al	3N	-	2.7	660	235	23.1	Smelting
Cr	3N5	-	7.22	1907	94	4.9	HIP,Smelting
Cu	4N	-	8.9	1084	400	16.5	Smelting
Ni	3N5	-	4.5	1453	90	13	Smelting
Ti	3N	-	4.5	1668	15.2	9.4	Smelting
Zr	3N	-	6.49	1852	0.227	-	Smelting
Si	4N	-	2.33	1414	150	2.6	Sintering&Spray
Ag	4N	-	10.49	961.93	429	19	Smelting
C	4N	-	2.23	3850±50	151	-	HIP
TiAl	3N5	AS REQUESTED	-	-	-	-	Smelting
InSn	4N	AS REQUESTED	-	-	-	-	Casting
CrSi	4N	AS REQUESTED	-	-	-	-	Spray
CrW	4N	AS REQUESTED	16.7	3017	57	6.3	HIP
NiCr	3N	AS REQUESTED	-	-	-	-	Smelting
NiV	3N	97:3	-	-	-	-	Smelting
WC	3N	-	15.77	2870	110	5.5	Sintering&Spray
NbOx	4N	-	4.6	1460	5	1.5	Sintering&Spray